Business Wire

Applied Materials Extends Copper/Low k Leadership with Innovative CMP Technology; Reflexion LK CMP System Planarizes Delicate Low k Interconnects at High Production Speeds

SANTA CLARA, Calif.--(BUSINESS WIRE)--June 25, 2003--Applied Materials, Inc. (Nasdaq:AMAT) announces Reflexion(R) LK, the industry's only low down force, high throughput CMP (chemical mechanical ...
EDN

Rohm and Haas Unveils New ACuPLANE™ Copper Barrier CMP Solution

HSINCHU, Taiwan — September 10, 2008 — Rohm and Haas Electronic Materials (NYSE:ROH), CMP Technologies, a leader and innovator in chemical mechanical planarization (CMP) technology for the global ...
EDN

Cabot reports 56% sequential growth in CMP copper slurry sales during quarter

AURORA, Ill.–Cabot Microelectronics Corp. here today reported sequentially flat revenues at $51.4 million in the company's fiscal fourth quarter, ended Sept. 30, compared to results from the prior ...