Researchers at University of Tsukuba have developed a technology for real-time estimation of the valence state and growth rate of iron oxide thin films during their formation. This novel technology ...

Reactive sputtering process employs the combination of a non inert gas, such as oxygen, and an elemental target material, such as silicon. This gas chemically reacts with the sputtered atoms within ...

In in-line PVD sputtering systems, substrates are linearly passed beneath one or more sputter cathodes to obtain their thin film coating. This motion is facilitated by loading the substrates onto a ...

The U.S. Sputtering Equipment Market is forecast to be worth approximately USD 0.56 billion in 2025 and will grow to reach an estimated value of USD 0.94 billion by 2035, at a CAGR of 5.31%. Meanwhile ...

In reactive sputtering process with an Ar + O₂ gas mixture, the plasma emission observed near the cathode changes in appearance. When the oxygen content is high, the plasma exhibits a reddish-violet ...